Semi-Insulating SiC Substrates & Optical Wafers

HPSI 4H, ρ ≥1E8 ohm·cm, FWHM (0004) ≤45 arcsec. Optical wafers n >2.65 @589 nm.

4H-SiC4–12 inchUltra-P · Production · Dummy
  • HPSI 4H-SiC
  • ρ ≥1E8 ohm·cm
  • FWHM ≤45 arcsec
  • Double-side CMP
  • 4 / 6 / 8 inch

High-purity semi-insulating SiC substrates serve GaN-on-SiC RF devices, high-power laser diode heat sinks and radar electronics. SiC optical wafers are used for windows, AR eyewear lenses and devices operating in harsh environments.

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Semi-Insulating SiC Substrates & Optical WafersSemi-Insulating SiC Substrates & Optical WafersSemi-Insulating SiC Substrates & Optical Wafers

Technical specifications

ProductSizeGradeThicknessKey specification
Semi-insulating HPSI4 inchProduction / Research / Dummy500 ± 25 μmρ ≥1E10 ohm·cm, micropipe ≤1 /cm²
Semi-insulating HPSI6 inchProduction / Research / Dummy500 ± 25 μmρ ≥1E8 ohm·cm, TTV ≤5 μm
Semi-insulating HPSI8 inchProduction / Dummy500 ± 25 μmρ ≥1E8 ohm·cm, TTV ≤10 μm
Optical wafer4 inchProduction500 / 700 ± 10 μmn >2.65 @589 nm, double-side CMP
Optical wafer6 inchProduction500 / 700 ± 10 μmHaze <0.3 %, micropipe ≤0.2 /cm²
Optical wafer8 inchProduction500 / 700 ± 10 μmAbsorption <0.5 % @450–650 nm

Typical parameters shown. Exact values per current technical specification.

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